28 Oct 2021
CMP Slurry market is poised to witness two fold growth by the end of 2029, driven by its expanding applications in consumer electronics. Efficacy to offer exceptional planarization and minimal surface defectivity makes CMP slurries an ideal ingredient in CMP (chemical mechanical polishing). CMP slurries will continue their legacy with the emerging need for new abrasives combined with advanced additives to maintain a steady growth trajectory. This in turn will propel the CMP slurry market to grow at an astounding CAGR of ~8% during the forecast period (2019-2029).
“Increasing necessity of tunable slurries with lower defectivity and high oxide removal rate will augment the demand for CMP slurries”, says the Fact.MR analyst.
CMP Slurry market is consolidated in nature in which Cabot Microelectronics Corporation, Dow DuPont and Hitachi Chemical Co Ltd. have accounted for over half of the market share in 2018. With a strong hold in the market, prominent companies are also offering innovative product solutions to maintain their supremacy in the market. For instance, product development by Dow and product launch by Cabot Microelectronics Corporation are some of the key strategies adopted by stakeholders during the historical period (2014-2018).
Fact.MR, in its new offering, presents an unbiased analysis of the CMP Slurry market, presenting historical demand data (2014-2018) and forecast statistics for the period of 2019-2029. The study divulges essential insights on CMP Slurry on the basis of product (aluminum oxide, ceramic, cerium oxide, silica and others) and application (silicon wafers, optical substrates, disk-drive components, and other microelectronic surfaces) across six major regions.
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Chemical Mechanical Planarization (CMP) Slurry Market
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